| | Preview | Author(s) | Title | Type | Issue Date |
| 1 | | Bethge, Ole ; Zimmermann, Christina ; Lutzer, Bernhard ; Simsek, Sinan ; Abermann, Stephan ; Bertagnolli, Emmerich | ALD Grown Rare-Earth High-k Oxides on Ge: Lowering of the Interface Trap Density and EOT Scalability | Konferenzbeitrag Inproceedings | 2014 |
| 2 | | Bethge, Ole ; Zimmermann, Christina ; Lutzer, Bernhard ; Simsek, Sinan ; Abermann, Stephan ; Bertagnolli, Emmerich | ALD Grown Rare-Earth High-k Oxides on Ge: Lowering of the Interface Trap Density and EOT Scalability | Artikel Article | 2014 |
| 3 | | Bethge, Ole ; Nobile, Michele ; Abermann, Stephan ; Glaser, Markus ; Bertagnolli, Emmerich | ALD grown bilayer junction of ZnO:Al and tunnel oxide barrier for SIS solar cell | Artikel Article | 2013 |
| 4 | | Bethge, O. ; Henkel, Christoph ; Abermann, S. ; Pozzovivo, G. ; Stoeger-Pollach, M. ; Werner, W.S.M. ; Smoliner, J. ; Bertagnolli, E. | Stability of La₂O₃ and GeO₂ passivated Ge surfaces during ALD of ZrO₂ high-k dielectric | Artikel Article | 2012 |
| 5 | | Bethge, O ; Pozzovivo, G ; Henkel, Christoph ; Abermann, S ; Bertagnolli, E | Fabrication of highly ordered nanopillar arrays and defined etching of ALD-grown all-around platinum films | Artikel Article | 2012 |
| 6 | | Bethge, Ole ; Henkel, Christoph ; Abermann, Stephan ; Hutter, H. ; Smoliner, Jürgen ; Bertagnolli, Emmerich | Impact of the ALD process on the inversion capacitance in Ge based MOS capacitors | Präsentation Presentation | 2012 |
| 7 | | Henkel, C. ; Abermann, S. ; Bethge, O. ; Pozzovivo, G. ; Klang, P. ; Stöger-Pollach, M. ; Bertagnolli, E. | Schottky barrier SOI-MOSFETs with high-k La2O3/ZrO2 gate dieelectrics | Artikel Article | 2011 |
| 8 | | Basnar, Bernhard ; Litschauer, Marco ; Abermann, Stefan ; Bertagnolli, Emmerich ; Strasser, Gottfried ; Neouze, Marie-Alexandra | Layer-by-layer assembly of titania nanoparticles based ionic networks | Artikel Article | 2011 |
| 9 | | Basnar, Bernhard ; Litschauer, Marco ; Abermann, Stephan ; Bertagnolli, Emmerich ; Strasser, Gottfried ; Néouze, Marie-Alexandra | Analysing nanoparticle monolayers covalently linked to silicon substrates | Konferenzbeitrag Inproceedings | 2011 |
| 10 | | Bethge, Ole ; Abermann, Stephan ; Henkel, Christoph ; Stöger-Pollach, Michael ; Smoliner, Jürgen ; Bertagnolli, Emmerich | ALD grown La2O3 for Ge-based MOS-device applications | Präsentation Presentation | 2011 |
| 11 | | Bethge, O. ; Abermann, S. ; Henkel, C. ; Smoliner, J. ; Bertagnolli, E. ; Straif, C. J. ; Hutter, H. | Atomic layer deposition temperature dependent minority carrier generation in ZrO2 /GeO2 /Ge capacitors | Artikel Article | 2011 |
| 12 | | Henkel, C. ; Abermann, S. ; Bethge, O. ; Pozzovivo, G. ; Klang, P. ; Reiche, M. ; Bertagnolli, E. | Ge p-MOSFETs With Scaled ALD 𝙻𝚊₂𝙾₃/𝚉𝚛𝙾₂ Gate Dielectrics | Artikel Article | Dec-2010 |
| 13 | | Bethge, O. ; Abermann, S. ; Henkel, C. ; Straif, C. J. ; Hutter, H. ; Smoliner, J. ; Bertagnolli, E. | Process temperature dependent high frequency capacitance-voltage response of ZrO₂/GeO₂/germanium capacitors | Artikel Article | 2010 |
| 14 | | Henkel, Christoph ; Abermann, Stephan ; Bethge, Ole ; Pozzovivo, Gianmauro ; Bertagnolli, Emmerich | Ge SB-p-MOSFET with ALD ZrO2/La2 O3 Dielectrics | Präsentation Presentation | 2010 |
| 15 | | Henkel, Christoph ; Bethge, Ole ; Abermann, Stephan ; Puchner, Stefan ; Hutter, Herbert ; Bertagnolli, Emmerich | Pt-assisted oxidation of "100...-Ge/high-k interfaces and improvement of their electrical quality | Artikel Article | 2010 |
| 16 | | Abermann, S. ; Henkel, C. ; Bethge, O. ; Pozzovivo, G. ; Klang, P. ; Bertagnolli, E. | Stabilization of a very high- k crystalline ZrO 2 phase by post deposition annealing of atomic layer deposited ZrO 2 /La 2 O 3 dielectrics on germanium | Artikel Article | 2010 |
| 17 | | Bethge, Ole ; Abermann, Stephan ; Henkel, Christoph ; Straif, C ; Hutter, H. ; Smoliner, Jürgen ; Bertagnolli, Emmerich | ALD of high-k oxides on (100) Ge-substrates: Scaling ability and interface engineering for MOS-device applications | Präsentation Presentation | 2010 |
| 18 | | Henkel, Christoph ; Bethge, Ole ; Abermann, Stephan ; Puchner, S. ; Hutter, H. ; Reiche, Manfred ; Bertagnolli, Emmerich | Atomic Layer Deposition of high-k dielectrics on GOI Substrates | Präsentation Presentation | 2010 |
| 19 | | Henkel, Christoph ; Abermann, Stephan ; Bethge, Ole ; Bertagnolli, Emmerich | Pt/Ge Schottky-Barrier Reduction by Rapid Thermal Diffusion of P Dopants | Buchbeitrag Book Contribution | 2010 |
| 20 | | Abermann, Stephan ; Ostermaier, Clemens ; Pozzovivo, Gianmauro ; Kuzmik, Jan ; Bethge, Ole ; Henkel, Christoph ; Strasser, Gottfried ; Pogany, Dionyz ; Giesen, C. ; Heuken, M ; Alomari, M ; Kohn, Erhard ; Bertagnolli, Emmerich | oeAtomic Layer Deposition of High-k Oxides on InAlN/GaN-Based Materials | Präsentation Presentation | 2009 |